TCAD development for lithography resolution enhancement

نویسندگان

  • Lars Liebmann
  • Scott M. Mansfield
  • Alfred K. Wong
  • Mark A. Lavin
  • William C. Leipold
  • Timothy G. Dunham
چکیده

Advances in lithography have contributed significantly to the advancement of the integrated circuit technology. While nonoptical next-generation lithography (NGL) solutions are being developed, optical lithography continues to be the workhorse for high-throughput very-large-scale integrated (VLSI) lithography. Extending optical lithography to the resolution levels necessary to support today’s aggressive product road maps increasingly requires the use of resolution-enhancement techniques. This paper presents an overview of several resolution-enhancement techniques being developed and implemented in IBM for its leading-edge CMOS logic and memory products.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

General framework for parameter optimization in imaging interferometric lithography

S. R. J. Brueck University of New Mexico Department of Electrical and Computer Engineering Department of Physics and Astronomy Albuquerque, New Mexico 87131 and Center for High Technology Materials University of New Mexico Albuquerque, New Mexico 87106 E-mail: [email protected] Abstract. Imaging interferometric lithography (IIL) employs the resolution enhancement technique (RET) of off-axis i...

متن کامل

Forbidden pitches in Sub-Wavelength Lithography and their Implications on Design

Moore’s Law has been the most important benchmark for microelectronics development over the past four decades. It has been interpreted to mean that critical dimensions (CD) of a design must shrink geometrically over time. The chip-level integration of devices has been possible through concurrent improvement in lithographic resolution. The lithographic resolution was primarily improved by moving...

متن کامل

Study and Development of a Simulation Tool for Optical Lithography

This paper presents a study and the implementation of a optical simulation tool based on wavelets. After this initial study it will be possible to implement resolution enhancement techniques (RET) such as optical proximity correction (OPC) and double patterning. Optical lithography simulation is an essential step to a Design for Manufacturability (DFM) flow. Simulation is used in mask printabil...

متن کامل

Modelling of Resolution Enhancement Processes in Lithography - Microelectronics, 1995. Proceedings., 1995 20th International Conference on

This paper describes the modelling and simulation of two resolution enhancement techniques in lithography ; 1) phase shift mask (PSM) technology and 2) top surface imaging (TSI) with silylation and dry development. The effect of the duty ratio on the image contrast is computed. Simulated one and two dimensional rim shifters and attenuated PSMs are presented. The effect of the aerial image on th...

متن کامل

Subwavelength Lithography (PSM,OPC)

Fabrication of fine features of smaller 0.15um is vital for future ultra-large scale integrated (ULSI) devices. An area of particular concern is whether and how optical lithography can delineate such feature sizes, i.e., smaller than the exposure wavelength. Resolution enhancement techniques for achieving subwavelength optical lithography are presented. Various types of phase shift mask (PSM) t...

متن کامل

ذخیره در منابع من

ذخیره در منابع من قبلا به منابع من ذحیره شده

{@ msg_add @}


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • IBM Journal of Research and Development

دوره 45  شماره 

صفحات  -

تاریخ انتشار 2001